chemical vapor deposition

The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.

研究所用的碳纳米管是用热灯丝化学气相沉积法合成的.

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Temperature sensor of Cr metal membrane made by radio frequency plasma chemical vapor deposition is discussed.

采用等离子体溅射方法制备了Cr金属薄膜式温度传感器。

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In this paper, we report the photoluminescence from high quality nanocrystalline ZnO thin films. The high quality nanocrystalline ZnO thin films are prepared by thermal oxidation of ZnS films at 800 ℃, which are deposited by low pressure metal organic chemical vapor deposition technique.

报道了利用低压金属有机物化学气相沉积技术生长纳米ZnS薄膜，然后，将ZnS薄膜在氧气中于800℃温度下进行热氧化制备高质量纳米ZnO薄膜。

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Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films highrate.

为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法.

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The globe-like diamond microcrystalline aggregates were fabricated by microwave plasma chemical vapor deposition ( MPCVD ) method.

在覆盖金属钛层的陶瓷上,利用微波等离子体化学气相沉积 ( MPCVD ) 法制备出类球状微米金刚石聚晶薄膜.

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Transmission Electron Microscopy and Secondary Ion Mass Spectrometry Study of n Si/ I p+ I SiGe/ n Si Structures Grown by Ultra High Vacuum Chemical Vapor Deposition

超高真空化学气相淀积法生长的n-Si/i-p~+-i SiGe/n-Si结构的透射电镜和二次离子质谱分析

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Carbon nanotubes were synthesized by a negative substrate bias-enhanced hot filament chemical vapor deposition system.

利用负衬底偏压增强热灯丝化学气相沉积系统制备了碳纳米管.

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Metal Organic Chemical Vapor Deposition ( MOCVD ) is a key technology in growing thin-films.

金属有机化学气相沉积 ( OCVD ) 一门制备薄膜材料的关键技术.

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A Technical Design and Experiment of the Chemical Vapor Deposition of AIN Film

化学气相淀积法合成氮化铝薄膜及其工艺设计

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Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.

所用的碳纳米管是用热灯丝化学气相沉积法合成的.

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Study on PPy/ UHMWPE fiber prepared by chemical vapor deposition

化学气相沉积PPy/UHMWPE纤维的研究

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SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition ( CVD ).

SWCNTs的 制备方法很多,包括电弧放电法 、 激光蒸发法、化学气相沉积法 ( ChemicalVapor Deposition,CVD ) 等.

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Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at temperature.

以镍片为基板材料,利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜.

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Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition.

工具用的复晶钻石涂层,则是使用化学气相沉积法制造的.

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Structures of Silicon Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition at Room Temperature

电感耦合等离子体CVD室温制备的硅薄膜的结构研究

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Study on the preparation techniques of nanometre sized SiO 2 powder through laser induced chemical vapor deposition method

LICVD制备纳米SiO2粉末工艺研究

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Ultrathin organosilicon films were synthesized by chemical vapor deposition.

用化学气相沉积方法制备了超薄有机硅膜.

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The Growth of ZnO Films by Metel-organic Chemical Vapor Deposition ( MOCVD) and the Fabrication and Study of ZnO UV Detector

MOCVD法ZnO薄膜生长及其紫外探测器的制备与初步研究

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Fused salt electrodeposition, magnetron sputteringand chemical vapor deposition were also methods of preparing platinum composite electrode.

此外,铂电极复合方法还有熔盐电镀, 磁控溅射,化学气相沉积等,指出了各种方法的优缺点及发展方向.

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Synthesis of multi-walled carbon nanotubes ( MWCNTs ) by floating catalysts with ethanol chemical vapor deposition ( ECVD ) was presented.

介绍了采用浮动催化剂法,利用乙醇化学气相沉积法制备多壁碳纳米管.

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The activation includes air and carbon dioxide activation and deposition includes chemical vapor deposition of benzene.

所采用的活化方法为空气活化和二氧化碳活化法.沉积方法为苯沉积.

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Composite film was prepared by on line chemical vapor deposition on float glass.

用化学气相沉积法在浮法玻璃上制备了复合薄膜.

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Silicon Diffusion Coating on Steel by Chemical Vapor Deposition of SiH_4

硅烷CVD法在钢基体表面生成硅扩散涂层

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Silicon films have been prepared with silane ( SiH_4) as the source gas by atmosphere pressure chemical vapor deposition ( APCVD) on moving glass substrates under the conditions simulating technical process on float glass production line.

模拟浮法在线镀膜玻璃生产工艺，采用常压化学气相沉积（APCVD）技术以硅烷（SiH4）为主要原料气体在移动的玻璃基板上制备硅薄膜。

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Carbon nanotubes ( CNTs ) were prepared from acetylene at 923 K with Ni as catalysts by chemical vapor deposition ( CVD ).

以乙炔为原料气,采用Ni粉为催化剂,在923K下,由化学气相沉积法 ( CVD ) 制得了碳纳米管.

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Synthesis of multi-walled carbon nanotubes ( MWCNTs) by floating catalysts with ethanol chemical vapor deposition ( ECVD) was presented.

介绍了采用浮动催化剂法，利用乙醇化学气相沉积法制备多壁碳纳米管。

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A chemical vapor deposition process that takes place at moderate temperatures.

一种化学汽相淀积过程,发生在适度的温度下.

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Another process described is plasma chemical vapor deposition process ( PCVD), which is used to produce SFP α-Fe_2O_3 for the manufacture of gas sensitive materials.

等离子气相淀积工艺（PCVD），合成SFP'α-Fe2O3，用作气敏材料。

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The material of 110-oriented monocrystal tungsten which was achieved by the technique of chemical vapor deposition on the substrate of monocrystal molybdenum alloy is one of the most promising materials which have been currently utilized for the emitter of thermionic energy converter.

合金化钼单晶基体表面气相沉积钨{110}择优取向钨单晶涂层是一种性能优越的热离子转换器的发射极材料。

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Ball-like diamond films were deposited in p-Si ( 100) substrate by a hot-filament chemical vapor deposition ( CVD) method.

在pSi（100）基体上用热丝CVD法沉积了球形金刚石薄膜。

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